Search research articles

ABOUT JoVE

Overview Leadership Blog JoVE Help Center

AUTHORS

Publishing Process Editorial Board Scope & Policies Peer Review FAQ Submit

LIBRARIANS

Testimonials Subscriptions Access Resources Library Advisory Board FAQ

RESEARCH

JoVE Journal Methods Collections JoVE Encyclopedia of Experiments Archive

EDUCATION

JoVE Core JoVE Business JoVE Science Education JoVE Lab Manual Faculty Resource Center Faculty Site

Terms & Conditions of Use

Related Concept Videos

Total Internal Reflection Fluorescence Microscopy

Total Internal Reflection Fluorescence Microscopy

Total internal reflection fluorescence microscopy or TIRF is an advanced microscopic technique used to visualize fluorophores in samples close to a solid surface with a higher refractive index, such as a glass coverslip. TIRF only allows fluorophores in proximity to the solid surface to be excited. When light from a medium with a lower refractive index (such as air) hits the glass coverslip at a critical angle, the light undergoes total internal reflection stead of passing through the glass.

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by

Same author

Role of damping in spin Seebeck effect in yttrium iron garnet thin films.

Science advances·2017

Same author

Spin-orbit torque-assisted switching in magnetic insulator thin films with perpendicular magnetic anisotropy.

Nature communications·2016

Same author

Fractional Talbot lithography with extreme ultraviolet light.

Optics letters·2014

Same author

Recording oscillations of sub-micron size cantilevers by extreme ultraviolet Fourier transform holography.

Optics express·2014

Same author

Hour-long continuous operation of a tabletop soft x-ray laser at 50-100 Hz repetition rate.

Optics express·2014

Same author

Tabletop single-shot extreme ultraviolet Fourier transform holography of an extended object.

Optics express·2013

Same journal

Denoising algorithm of Φ-OTDR systems based on adaptive fractional wavelet transform denoising.

Optics express·2026

Same journal

Millisecond photon-to-photon latency and high-speed volumetric projection system for optogenetics.

Optics express·2026

Same journal

Polarization-encoded coaxial structured light for high-precision 3D surface profilometry.

Optics express·2026

Same journal

Discrete freeform optical design based on collaborative optimization of point cloud and local normals.

Optics express·2026

Same journal

Ultrafast ghost imaging with 25 GHz speckle switching and wavelength-division multiplexing.

Optics express·2026

Same journal

Atomic vapor cells fabricated by femtosecond laser welding of standard-optical-quality glass.

Optics express·2026

See all related articles

Search research articles

Related Experiment Video

Updated: Mar 31, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

Extreme ultraviolet Talbot interference lithography.

Wei Li, Mario C Marconi

|October 20, 2015

Summary

This summary is machine-generated.

This study introduces a hybrid extreme ultraviolet (EUV) lithography method combining Talbot and interference techniques. This novel approach allows for the creation of complex nanopatterns by filling arbitrary cell shapes with interference patterns.

More Related Videos

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

Published on: January 27, 2017

Patterning via Optical Saturable Transitions - Fabrication and Characterization

Patterning via Optical Saturable Transitions - Fabrication and Characterization

Published on: December 11, 2014

Related Experiment Videos

Last Updated: Mar 31, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

Published on: January 27, 2017

Patterning via Optical Saturable Transitions - Fabrication and Characterization

Patterning via Optical Saturable Transitions - Fabrication and Characterization

Published on: December 11, 2014

Area of Science:

Nanofabrication
Lithography
Optics

Background:

Traditional Talbot and interference lithography methods have limitations in pattern complexity and resolution.
Talbot lithography faces challenges with depth of focus and master mask fabrication.
Interference lithography is restricted to simple periodic patterns.

Purpose of the Study:

To develop a hybrid extreme ultraviolet (EUV) lithography technique.
To overcome the limitations of existing nanopatterning methods.
To enable the creation of arbitrary shaped cells filled with interference patterns.

Main Methods:

A hybrid approach combining Talbot lithography and interference lithography.
Utilizing extreme ultraviolet (EUV) light source.
Detailed system modeling and design.

Main Results:

Successful generation of interference patterns within arbitrary shaped cells.
Demonstration of a hybrid EUV lithography system.
Experimental validation using a tabletop EUV laser.

Conclusions:

The hybrid EUV lithography method effectively combines the strengths of Talbot and interference lithography.
This technique offers enhanced flexibility for creating complex nanopatterns.
The developed method shows promise for advanced nanofabrication applications.