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Ultrasensitive Phototransistors Based on Few-Layered HfS2

Kai Xu1, Zhenxing Wang1, Feng Wang1

  • 1National Center for Nanoscience and Technology, Beijing, 100190, P. R. China.

Advanced Materials (Deerfield Beach, Fla.)
|October 27, 2015
PubMed

Keywords:
HfS2flake thicknessmetal contactsphototransistorsresponsivity

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