Updated: Mar 30, 2026

Atomically Traceable Nanostructure Fabrication
Published on: July 17, 2015
Nicolas Sobel1, Christian Hess2
1Eduard-Zintl-Institut für Anorganische und Physikalische Chemie, Technische Universität Darmstadt, Alarich-Weiss-Strasse 8, 64287 Darmstadt (Germany).
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Atomic layer deposition (ALD) enables precise nanoscale surface structuring for diverse applications. This technique offers conformal coatings on complex materials, advancing fields like catalysis and energy.
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