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Laterally Ordered Sub-10 nm Features Obtained From Directed Self-Assembly of Si-Containing Block Copolymer Thin Films
Yecheol Rho1, Karim Aissou1, Muhammad Mumtaz1,2
1Laboratoire de Chimie des Polymères Organiques, CNRS-ENSCPB-Université de Bordeaux, 16 Avenue Pey-Berland, F-33607, Pessac CEDEX, France.
Abstract:
Laterally ordered sub-10 nm features are produced from the directed self-assembly of poly(1,1-dimethyl silacyclo-butane)-block-poly(methyl methacrylate) (PDMSB-b-PMMA) thin films on sinusoidal azobenzene-containing patterns. The use of sinusoidal surface relief grating enables the formation of very large grain areas (over several µm(2) ) consisting of out-of-plane PMMA cylinders.
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