Simple technique for high-throughput marking of distinguishable micro-areas for microscopy

Area of Science:

• Materials Science
• Nanotechnology
• Microscopy

Background:

• Investigating nanoscale materials requires correlating data from multiple microscopy techniques at specific sample locations.
• Precise sample orientation and feature identification are critical for multi-modal analysis but often challenging.
• Existing marking methods can be time-consuming or unsuitable for high-throughput batch processing.

Purpose of the Study:

• To present a simple, cost-effective, and high-throughput method for marking multiple sample areas for correlative microscopy.
• To enable precise localization and correlation of data from diverse microscopy techniques on identical sample regions.
• To overcome orientation challenges in samples lacking prominent features.

Main Methods:

• Utilizing a commercial transmission electron microscopy (TEM) grid as a shadow mask during thin-film deposition.
• Marking hundreds of approximately 15x15 μm areas simultaneously.
• Employing aluminium deposition via electron-beam evaporation onto flat sample surfaces for optimal line-of-sight deposition.
• Using a reference or finder grid structure for easy identification of marked areas.

Main Results:

• Demonstrated the suitability of the method for combining light microscopy, scanning probe microscopy (SPM), and scanning electron microscopy (SEM).
• Achieved good line-of-sight deposition with aluminium using electron-beam evaporation.
• Successfully marked hundreds of sample areas efficiently.
• Showcased the method's advantage over focused ion-beam (FIB) processing for batch applications.

Conclusions:

• The developed shadow mask technique provides an inexpensive and efficient way to mark sample areas for correlative microscopy.
• This method significantly simplifies the process of correlating multi-modal microscopy data, especially for challenging samples.
• The technique is particularly valuable when combined with methods like focused ion-beam sectioning for targeted analysis.