Related Experiment Video
Updated: Mar 30, 2026

Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
Published on: November 1, 2013
InGaN self-assembled quantum dots grown by metal-organic chemical vapour deposition with growth interruption
1Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, Ta Hsueh Road, Hsinchu 30050, Taiwan, Republic of China.
Abstract:
Self-assembled InGaN quantum dots (QDs) were grown by metal-organic chemical vapour deposition with growth interruption at low V/III ratio and low growth temperature on sapphire substrates. The effects of the interruption time on the morphological and optical properties of InGaN QDs were studied. The results show that the growth interruption can modify the dimension and distribution of InGaN QDs, and cause the QD emission wavelength to blue shift with increasing interruption time. A density of InGaN QDs of about 4.5 × 10(10) cm(-2) with an average lateral size of 11.5 nm and an average height of 1.6 nm can be obtained by using a growth interruption time of 60 s.

