Rapid Electron Beam Writing of Topologically Complex 3D Nanostructures Using Liquid Phase Precursor

Area of Science:

• Nanoscale science and engineering
• Additive manufacturing
• Materials science

Background:

• Focused electron beam-induced deposition (FEBID) is a direct-write nanoscale fabrication technique.
• Current FEBID methods face limitations in throughput, precursor availability, and 3D structure complexity.
• These limitations hinder the widespread adoption and advancement of FEBID technology.

Purpose of the Study:

• To overcome the throughput and precursor limitations of conventional FEBID.
• To demonstrate a novel FEBID approach using liquid precursors for enhanced fabrication.
• To enable the creation of complex 3D nanostructures with improved substrate adhesion.

Main Methods:

• Utilized nanoelectrospray liquid precursor injection for focused electron beam-induced deposition (FEBID).
• Employed direct decomposition and electrochemical reduction of liquid precursors.
• Initiated nanostructure growth at the free surface of a liquid pool.

Main Results:

• Achieved fabrication growth rates 10^5 times greater than standard gas-phase FEBID.
• Successfully grew carbon nanostructures with complex 3D topologies and strong substrate adhesion.
• Demonstrated deposition of pure silver microstructures at comparable high growth rates.

Conclusions:

• Liquid precursor injection significantly enhances FEBID throughput and precursor versatility.
• The developed method allows for the fabrication of intricate 3D carbon nanostructures.
• This technique shows promise for advanced nanoscale additive manufacturing, including metal deposition.