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Related Experiment Video

Updated: Mar 30, 2026

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Method for making a single-step etch mask for 3D monolithic nanostructures.

D A Grishina1, C A M Harteveld, L A Woldering

  • 1Complex Photonic Systems (COPS), MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands.

Nanotechnology
|November 20, 2015
PubMed
Summary
This summary is machine-generated.

This study introduces a novel 3D mask fabrication method using CMOS-compatible processes for creating intricate three-dimensional nanostructures. This technique enables precise etching of complex silicon architectures, including photonic crystals and cavity arrays.

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Area of Science:

  • Materials Science and Engineering
  • Nanotechnology
  • Photonics

Background:

  • Traditional nanostructure fabrication using etching is limited to planar structures due to reliance on planar masks.
  • Achieving three-dimensional (3D) nanostructures via etching necessitates advanced techniques beyond conventional planar masks.

Purpose of the Study:

  • To present a novel method for fabricating a 3D mask compatible with CMOS processes.
  • To enable the etching of 3D monolithic nanostructures with high precision and alignment.

Main Methods:

  • Fabrication of a 3D mask in a hard-mask layer on two adjacent inclined silicon wafer surfaces.
  • Single-step projection of two distinct 2D patterns onto the inclined surfaces, ensuring pattern alignment.
  • Etching of deep pores in oblique directions to form the 3D nanostructure in silicon.

Main Results:

  • Demonstrated 3D mask fabrication for silicon diamond-like photonic band gap crystals, exhibiting a broad optical stop gap.
  • Proposed realization of 3D nanostructures for five Bravais lattices (cubic, tetragonal, orthorhombic, monoclinic, hexagonal).
  • Achieved alignment accuracy better than 3.0 nm between 2D mask patterns on inclined surfaces.

Conclusions:

  • The presented CMOS-compatible 3D mask fabrication method successfully enables the creation of well-defined monolithic 3D nanostructures.
  • This technique offers a versatile platform for fabricating various 3D nanostructures, including photonic crystals and 3D cavity arrays.
  • The high alignment accuracy ensures the precise construction of complex 3D architectures for advanced applications.