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Updated: Mar 29, 2026

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
Extremely Low Contact Resistance on Graphene through n-Type Doping and Edge Contact Design
Hyung-Youl Park1, Woo-Shik Jung2, Dong-Ho Kang1
1School of Electronics and Electrical Engineering, Sungkyunkwan University, Suwon, 440-746, Korea.
Abstract:
The effects of graphene n-doping on a metal-graphene contact are studied in combination with 1D edge contacts, presenting a record contact resistance of 23 Ω μm at room temperature (19 Ω μm at 100 K). This contact scheme is applied to a graphene-perovskite hybrid photodetector, significantly improving its performance (0.6 → 1.8 A W(-1) in photoresponsivity and 3.3 × 10(4) → 5.4 × 10(4) Jones in detectivity).
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