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Updated: Mar 28, 2026
Fabrication of Three-Dimensional Graphene-Based Polyhedrons via Origami-Like Self-Folding
Published on: September 23, 2018
3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene
Ju Young Kim1, Joonwon Lim1, Hyeong Min Jin1
1National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Material Science & Engineering, KAIST, Daejeon, 34141, Republic of Korea.
Abstract:
Novel 3D self-assembled nanopatterning is presented via tailored crumpling of chemically modified graphene. Block-copolymer self-assembly formed on a layer of chemically modified graphene provides highly dense and uniform 2D nanopatterns, and the controlled crumpling of the chemically modified graphene by mechanical instabilities realizes the controlled 3D transformation of the self-assembled nanopatterns.
