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Measurement of Quantum Interference in a Silicon Ring Resonator Photon Source

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Published on: April 4, 2017

Mode-evolution-based polarization rotation and coupling between silicon and hybrid plasmonic waveguides.

Sangsik Kim¹, Minghao Qi¹

¹School of Electrical and Computer Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, IN 47907 USA.

Scientific Reports

|December 19, 2015

Summary

This study introduces a novel structure for efficient coupling of light into hybrid plasmonic (HP) modes. The device achieves high coupling efficiency and broad wavelength operation for on-chip photonic applications.

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Area of Science:

Photonics
Nanophotonics
Plasmonics

Background:

Hybrid plasmonic (HP) modes offer strong optical confinement and low propagation loss for on-chip photonic devices.
Low coupling efficiency between dielectric guided modes and HP modes hinders practical implementation due to mode mismatch and polarization differences.

Purpose of the Study:

To develop a mode-evolution-based structure for efficient polarization rotation and coupling of TE modes to HP modes.
To overcome the limitations of existing methods for integrating dielectric waveguides with plasmonic structures.

Main Methods:

A mode-evolution-based polarization rotation and coupling structure was designed and simulated.
The structure adiabatically rotates the TE mode in a silicon waveguide and couples it to the HP mode in a silicon-dielectric-metal waveguide.
Simulations were performed using various metal caps (Ag, Au, Al, Cu) to assess coupling factors and conversion lengths.

Main Results:

High coupling factors were achieved: 92% (Ag), 78% (Au), 75% (Al), and 73% (Cu) at a conversion length of ~5 μm.
A coupling factor >64% was maintained over an ultra-broad wavelength range (1300-1800 nm) with a Ag metal cap.
Total back-reflection power was below -40 dB due to adiabatic mode transition, indicating minimal signal loss.

Conclusions:

The proposed device enables efficient and broadband coupling to hybrid plasmonic modes.
The design is tolerant to fabrication variations and does not require high-resolution lithography, making it suitable for mass production.
This technology is promising for optical transport systems across all telecommunication bands.