Related Experiment Video
Updated: Mar 28, 2026
08:49
Atomically Defined Templates for Epitaxial Growth of Complex Oxide Thin Films
Published on: December 4, 2014
14.9K
Modeling Mechanism and Growth Reactions for New Nanofabrication Processes by Atomic Layer Deposition
Simon D Elliott1, Gangotri Dey1,2, Yasheng Maimaiti1
1Tyndall National Institute, University College Cork, Lee Maltings, Dyke Parade, Cork, Ireland.
Advanced Materials (Deerfield Beach, Fla.)
|December 23, 2015
Abstract:
Recent progress in the simulation of the chemistry of atomic layer deposition (ALD) is presented for technologically important materials such as alumina, silica, and copper metal. Self-limiting chemisorption of precursors onto substrates is studied using density functional theory so as to determine reaction pathways and aid process development. The main challenges for the future of ALD modeling are outlined.
