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Updated: Mar 28, 2026

Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
Published on: October 23, 2018
On the mechanism of ultrasonic loading effect in silicon-based Schottky diodes
Oleg Olikh1, Katerina Voytenko1
1Taras Shevchenko National University of Kyiv, 64/13, Volodymyrska Street, Kyiv 01601, Ukraine.
Abstract:
The influence of ultrasonic loading on current-voltage characteristics of Mo/n-n(+)-Si structures has been investigated. The research of Schottky barrier height variation has been carried out for various ultrasonic waves frequency (4.1, 8.4, and 27.8 MHz), intensity (up to 0.8 W/cm(2)) and loading temperature (160-330 K). The obtained results have been analyzed on account of the dislocation nature of the interface patches and model of ultrasound absorption by dislocation kinks. The values of the kink diffusion activation energy Wk=(90±10) meV and the frequency parameter fk=(3±2)·10(9) Hz have been determined.
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