Basal Plane Fluorination of Graphene by XeF2 via a Radical Cation Mechanism
Yijun Liu1, Benjamin W Noffke1, Xiaoxiao Qiao1
1Department of Chemistry, Indiana University , Bloomington, Indiana 47405, United States.
Abstract:
Graphene fluorination with XeF2 is an attractive method to introduce a nonzero bandgap to graphene under mild conditions for potential electro-optical applications. Herein, we use well-defined graphene nanostructures as a model system to study the reaction mechanism of graphene fluorination by XeF2. Our combined experimental and theoretical studies show that the reaction can proceed through a radical cation mechanism, leading to fluorination and sp(3)-hybridized carbon in the basal plane.
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