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Single-photon-multi-layer-interference lithography for high-aspect-ratio and three-dimensional SU-8

Siddharth Ghosh^1,2, G K Ananthasuresh¹

¹Department of Mechanical Engineering, Indian Institute of Science, Bangalore, 560012, Karnataka, India.

Scientific Reports

|January 5, 2016

Summary

Researchers created high-aspect-ratio SU-8 microstructures exceeding 250:1 using multi-layer, single-photon lithography. This novel method enables precise control over photo-induced polymerization for advanced 3D micro/nanofabrication.

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Area of Science:

Materials Science
Nanotechnology
Photonics

Background:

High-aspect-ratio microstructures are crucial for various applications.
Fabricating SU-8 microstructures with high aspect ratios presents significant challenges.

Purpose of the Study:

To develop a novel method for creating super-high-aspect-ratio SU-8 microstructures.
To achieve controlled photo-induced polymerization for 3D micro/nanofabrication.

Main Methods:

Utilized multi-layer, single-photon lithography with a 405 nm laser.
Employed a converging laser beam and controlled aperture for localized polymerization.
Leveraged substrate reflection to influence microstructure edge profiles and achieve sub-wavelength features.

Main Results:

Achieved aspect ratios exceeding 250:1 in SU-8 microstructures.
Fabricated microstructures with thicknesses up to 100 μm.
Obtained a 75 nm tip diameter on pyramid-shaped microstructures.
Demonstrated sub-wavelength feature sizes through interference effects.

Conclusions:

The multi-layer, time-lapsed writing approach enables precise control over SU-8 polymerization.
This method allows for the realization of super-high-aspect-ratio and 3D micro-/nanostructures.
The study addresses critical challenges in photoresist-based micro/nanofabrication.