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Updated: Mar 27, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Shu He1, Zhuang Xie1, Daniel J Park1
1Department of Chemistry and International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, IL, 60208, USA.
Liquid phase beam pen lithography (BPL) enables precise nanoscale patterning. This study explores BPL parameters for synthesizing nucleotide nanoarrays, demonstrating its potential for localized photochemical reactions in liquid media.
13:10Creating Adhesive and Soluble Gradients for Imaging Cell Migration with Fluorescence Microscopy
Published on: April 4, 2013
09:45Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
Published on: June 12, 2018
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