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P-Type Polar Transition of Chemically Doped Multilayer MoS2 Transistor
Xiaochi Liu1, Deshun Qu1, Jungjin Ryu1
1Samsung-SKKU Graphene/2D Center (SSGC), Department of Nano Science and Technology, SKKU Advanced Institute of Nano-Technology (SAINT), School of Mechanical Engineering, Sungkyunkwan University, 2066, Seobu-ro, Jangangu, Suwon, Gyeonggi-do, 440-746, Korea.
Abstract:
A high-performance multilayer MoS2 p-type field-effect transistor is realized via controllable chemical doping, which shows an excellent on/off ratio of 10(9) and a maximum hole mobility of 132 cm(2) V(-1) s(-1) at 133 K. The developed technique will enable 2D materials to be used for future high-efficiency and low-power semiconductor device applications.
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