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Stimulated Emission Depletion Lithography with Mercapto-Functional Polymers
Bianca Buchegger1, Johannes Kreutzer2, Birgit Plochberger3,4
1Institute of Applied Physics, Johannes Kepler University Linz , Altenberger Straße 69, 4040 Linz, Austria.
ACS Nano
|January 28, 2016
Summary
Researchers created reactive nanostructures using stimulated emission depletion (STED) lithography. These nanostructures exhibit full STED effect depletion and high reactivity for further functionalization.
Area of Science:
- Nanotechnology
- Materials Science
- Photolithography
Background:
- Stimulated Emission Depletion (STED) lithography enables high-resolution patterning.
- Functionalizing nanostructures is crucial for advanced applications.
- Metal oxo clusters offer versatile surface chemistry.
Purpose of the Study:
- To fabricate surface-reactive nanostructures using STED lithography.
- To functionalize these nanostructures with reactive ligands.
- To investigate the impact of cluster loading on STED efficiency.
Main Methods:
- Fabrication of nanostructures via STED lithography.
- Copolymerization of bifunctional metal oxo clusters with triacrylate monomers.
- Investigation of STED depletion efficiency at varying cluster concentrations.
- Testing surface reactivity with mercapto-reactive fluorophores.
Main Results:
- Achieved feature sizes of λ/11 using a donut-shaped depletion beam.
- Observed full depletion of the STED effect at cluster loadings exceeding 4 wt %.
- Demonstrated retained reactivity of surface mercapto groups after polymerization.
Conclusions:
- STED lithography is effective for creating functionalized nanostructures.
- Metal oxo cluster loading significantly influences STED efficiency.
- The developed nanostructures possess reactive surfaces suitable for further modification.
