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Athermal Azobenzene-Based Nanoimprint Lithography
Christian Probst1, Christoph Meichner2, Klaus Kreger1
1Macromolecular Chemistry I and Bayreuth, Institute of Macromolecular Research, University of Bayreuth, D-95440, Bayreuth, Germany.
Advanced Materials (Deerfield Beach, Fla.)
|January 30, 2016
Summary
A new nanoimprint lithography method uses photofluidization of azobenzene materials for tunable, ambient condition patterning. This technique avoids resist shrinkage, enabling precise surface structuring down to 100 nm.
Area of Science:
- Materials Science
- Nanotechnology
- Lithography
Background:
- Nanoimprint lithography is crucial for micro- and nanofabrication.
- Existing methods often require harsh conditions or lead to material shrinkage.
- Azobenzene materials offer unique photoresponsive properties.
Purpose of the Study:
- To introduce a novel nanoimprint lithography technique.
- To leverage the photofluidization effect for improved patterning.
- To demonstrate ambient condition imprinting without resist shrinkage.
Main Methods:
- Utilized a novel nanoimprint lithography approach.
- Employed azobenzene materials and their photofluidization effect.
- Performed patterning under ambient conditions.
Main Results:
- Successfully demonstrated tunable nanoimprint lithography.
- Achieved imprinting without crosslinking reactions or resist shrinkage.
- Patterned surfaces with features ranging from micrometers down to 100 nm.
Conclusions:
- The photofluidization-based nanoimprint lithography is a viable technique.
- This method offers advantages like ambient processing and no shrinkage.
- It enables high-resolution surface patterning for various applications.
