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Updated: Mar 25, 2026

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

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Nanoparticles at SEA: Seeding, Etching, and Applications

Gregory V Hartland¹

¹University of Notre Dame , Notre Dame, Indiana 46556, United States.

The Journal of Physical Chemistry Letters

|February 19, 2016

Summary

No abstract available in PubMed .

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