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Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
Published on: December 16, 2011
Radical-Induced Hydrosilylation Reactions for the Functionalization of Two-Dimensional Hydride Terminated Silicon
Tobias Helbich1, Alina Lyuleeva2, Ignaz M D Höhlein1
1Wacker-Lehrstuhl für Makromolekulare Chemie, Technische Universität München, Lichtenbergstrasse 4, 85747, Garching, Germany.
Abstract:
Herein we present the functionalization of freestanding silicon nanosheets (SiNSs) by radical-induced hydrosilylation reactions. An efficient hydrosilylation of Si-H terminated SiNSs can be achieved by thermal initiation or the addition of diazonium salts with a variety of alkene or alkyne derivatives. The radical-induced hydrosilylation is applicable for a wide variety of substrates with different functionalities, improving the stability and dispersibility of the functional SiNSs in organic solvents and potentially opening up new fields of application for these hybrid materials.
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