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Updated: Mar 24, 2026

Preparing an Isotopically Pure 229Th Ion Beam for Studies of 229mTh
Published on: May 3, 2019
Compact permanent magnet H⁺ ECR ion source with pulse gas valve
Y Iwashita1, H Tongu1, Y Fuwa1
1Institute for Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan.
A new compact electron cyclotron resonance (ECR) ion source uses pulsed hydrogen gas flow to reduce vacuum system load. A fast piezo gas valve achieves a few milliseconds response time for pulsed gas delivery.
Area of Science:
- Plasma Physics
- Ion Source Technology
Background:
- Electron Cyclotron Resonance (ECR) ion sources are crucial for various applications requiring high-intensity ion beams.
- Efficient gas handling is essential for optimizing the performance and reducing the load on vacuum systems in ECR ion sources.
Purpose of the Study:
- To develop and test a compact H(+) ECR ion source with pulsed gas operation.
- To investigate the effectiveness of a piezo gas valve for rapid gas flow modulation.
Main Methods:
- Development of a compact ECR ion source utilizing permanent magnets.
- Integration of a specially designed piezo gas valve for pulsed gas delivery.
- Testing of the 6 GHz ECR ion source with the piezo gas valve and measurement of gas flow response time using a fast ion gauge.
Main Results:
- Successful development of a compact H(+) ECR ion source.
- Demonstration of pulsed hydrogen gas flow operation.
- Achieved a fast response time of a few milliseconds for the gas flow using the piezo valve.
Conclusions:
- Pulsed gas operation with a piezo valve is an effective method for reducing gas loads in vacuum systems for ECR ion sources.
- The developed compact ECR ion source with pulsed gas delivery shows promise for improved vacuum management.
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