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Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle01:19

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Atomic emission spectroscopy (AES) is an analytical technique used to determine the elemental composition of a sample by analyzing the light emitted from excited atoms. In AES, atoms in a sample are excited to higher energy levels by thermal energy from high-temperature sources, such as plasma, arcs, or sparks. When these excited atoms return to lower energy states, they emit light at specific wavelengths characteristic of each element. The resulting atomic emission spectrum, which consists of...
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Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
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AES is a powerful analytical technique, especially effective when used with plasma sources, producing abundant spectra in characteristic emission lines. The Inductively Coupled Plasma (ICP), in particular, yields superior quantitative analytical data due to its high stability, low noise, low background, and minimal interferences under optimal experimental conditions. However, newer air-operated microwave sources are emerging as promising alternatives that could be more cost-effective than...
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The instrumentation of atomic emission spectrometry (AES) involves various components, including atomization devices that convert samples into gas-phase atoms and ions. There are two main types of atomization devices: continuous and discrete atomizers.  Continuous atomizers, like plasmas and flames, introduce samples in a constant stream, while discrete atomizers inject individual samples using syringes or autosamplers. The most common discrete atomizer is the electrothermal atomizer.
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Efficient cesiation in RF driven surface plasma negative ion source.

Yu Belchenko1, A Ivanov1, S Konstantinov1

  • 1Budker Institute of Nuclear Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk, Russia.

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Summary
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A small amount of cesium seed significantly enhances hydrogen negative ion (H-) production in radio-frequency negative ion sources. Cesium coverage replenishment is key to maintaining high H- yields over extended experimental runs.

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Area of Science:

  • Plasma Physics
  • Atomic and Molecular Physics
  • Materials Science

Background:

  • Radio-frequency (RF) negative ion sources are crucial for fusion energy research.
  • Cesium seeding is a known method to enhance negative ion production, but its long-term effects and recovery mechanisms require further investigation.

Purpose of the Study:

  • To investigate the effect of a small, directed cesium seed on hydrogen negative ion (H-) production in a large RF negative ion source.
  • To understand the dynamics of H- yield changes over extended experimental periods, including degradation and recovery.
  • To explore the role of cesium coverage and its replenishment in maintaining high negative ion yields.

Main Methods:

  • Utilized a large radio-frequency negative ion source with a directed cesium deposition system targeting the plasma grid periphery.
  • Introduced a small cesium seed (approximately 0.5 g) for a 2-month experimental cycle.
  • Monitored H- production yield over time, observing effects of cesium addition, air exposure, and subsequent beam conditioning.

Main Results:

  • A small cesium seed led to enhanced H- production during a 2-month experimental cycle.
  • H- yield gradually increased after cesium addition and decreased after air exposure or cesium removal.
  • Source conditioning with beam shots gradually recovered H- yield to high values, suggesting a role for cesium coverage replenishment.

Conclusions:

  • Directed cesium deposition is effective in enhancing H- production in RF negative ion sources.
  • Cesium coverage plays a critical role in maintaining high negative ion yields, with recovery possible through sputtering and replenishment mechanisms.
  • Understanding these dynamics is vital for optimizing long-term operation of negative ion sources for fusion applications.