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Creating Reversible p-n Junction on Graphene through Ferritin Adsorption
Yana Mulyana1, Mutsunori Uenuma1, Naofumi Okamoto1
1Nara Institute of Science and Technology, Graduate School of Materials Science , 8916-5 Takayama, Ikoma, Nara 630-0192, Japan.
ACS Applied Materials & Interfaces
|March 5, 2016
Summary
Researchers created a stable graphene p-n junction using ferritin protein. Electron beam irradiation modified ferritin charge, enabling p-n junction formation and improving graphene field-effect transistor (G-FET) performance.
Area of Science:
- Materials Science
- Nanotechnology
- Biophysics
Background:
- Graphene-based field-effect transistors (G-FETs) require stable p-n junctions for advanced applications.
- Controlling surface charge and properties of graphene is crucial for device performance.
Purpose of the Study:
- To present an alternative method for constructing stable p-n junctions on G-FETs.
- To investigate the charge modification of ferritin via electron beam irradiation for G-FET applications.
- To demonstrate water-gate operation of the fabricated p-n junction.
Main Methods:
- Physical adsorption of ferritin (spherical protein shell) onto graphene.
- Electron beam (EB)-irradiation of native ferritin to alter its surface charge.
- Fabrication and characterization of p-n junctions on G-FETs.
- Water-gate operation testing.
Main Results:
- Stable p-n junctions were successfully constructed on G-FETs using ferritin.
- EB-irradiation reversed the native negative charge of ferritin to positive.
- EB-irradiation removed adsorbed charged impurities on graphene, shifting the Dirac point to Vg = 0.
- The G-FET with the ferritin-based p-n junction operated effectively using a water-gate.
Conclusions:
- Ferritin's charge can be controllably modified by EB-irradiation, enabling G-FET p-n junction fabrication.
- This method offers a novel approach for stable p-n junction construction and graphene property tuning.
- The developed G-FET demonstrates potential for water-gated electronic devices.

