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Updated: Mar 24, 2026

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Low Pressure Vapor-assisted Solution Process for Tunable Band Gap Pinhole-free Methylammonium Lead Halide Perovskite Films
Published on: September 8, 2017
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A novel dimethylformamide (DMF) free bar-cast method to deposit organolead perovskite thin films with improved
Eurig W Jones1, Peter J Holliman1, Arthur Connell1
1School of Chemistry, Bangor University, Bangor, Gwynedd LL57 2UW, UK.
Abstract:
We report a solvent-free approach to synthesizing organolead perovskites by using solid state reactions to coat perovskite crystals onto Al2O3 or TiO2 nanoparticles followed by addition of terpineol affording perovskite inks. We have bar cast these inks to produce photoactive perovskite thin films which are significantly more stable to humidity than solution-processed films. This new method also avoids the use of toxic DMF solvent.

