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    A new autofocus system for spatial light modulator (SLM)-based photolithography achieves high-precision focusing. This system ensures focus on the substrate surface for submicrometer structure resolution without impacting photoresist performance.

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    Area of Science:

    • Optics
    • Photolithography
    • Nanotechnology

    Background:

    • Submicrometer resolution in photolithography requires precise optical focusing.
    • Autofocus systems with a depth of field of a few hundred nanometers are crucial for maintaining focus on the substrate surface during fabrication.
    • Spatial light modulator (SLM)-based maskless photolithography demands advanced focusing capabilities.

    Purpose of the Study:

    • To develop a high-precision autofocus system for SLM-based maskless photolithography.
    • To ensure accurate focusing on the substrate surface without compromising photoresist performance.
    • To evaluate autofocus algorithms for optimal time efficiency and accuracy in this application.

    Main Methods:

    • Development of an autofocus system utilizing contrast measurement.
    • Integration of focus-pattern illumination to enhance contrast at the substrate surface.
    • Evaluation of various autofocus algorithms and focus-pattern combinations.

    Main Results:

    • The developed autofocus system achieves high-precision focusing for SLM-based photolithography.
    • The system maintains focus on the substrate surface, crucial for submicrometer resolution.
    • Photoresist performance is not adversely affected by the focusing process.
    • Analysis identified optimal focus-pattern and algorithm combinations for efficiency and accuracy.

    Conclusions:

    • The novel autofocus system is effective for SLM-based maskless photolithography.
    • Precise focusing is achievable with minimal depth of field, enabling submicrometer structure fabrication.
    • The system offers a viable solution for demanding photolithographic applications requiring high accuracy.