Oxidative stress at low levels can induce clustered DNA lesions leading to NHEJ mediated mutations

Vyom Sharma1, Leonard B Collins1, Ting-Huei Chen2

  • 1Department of Environmental Sciences and Engineering, Gillings School of Global Public Health, Chapel Hill, NC 27599, USA.

Oncotarget
|March 26, 2016
PubMed

Insights

Low levels of hydrogen peroxide (H2O2) cause DNA damage, specifically oxidative clustered DNA lesions (OCDLs) and DNA double-strand breaks (DSBs). This genomic instability contributes to mutagenesis and various human diseases.

Area of Science:

  • Molecular Biology
  • Genetics
  • Biochemistry

Background:

  • Oxidative stress and DNA damage are linked to human pathologies like cancer.
  • Reactive oxygen species (ROS) may cause mutations via DNA double-strand breaks (DSBs), but DSB generation at low ROS levels is debated.

Purpose of the Study:

  • To investigate if biologically-relevant levels of hydrogen peroxide (H2O2) induce DNA double-strand breaks (DSBs).
  • To determine the role of the non-homologous end joining (NHEJ) pathway in repairing H2O2-induced DNA damage.

Main Methods:

  • Treatment of cells with low levels of H2O2.
  • Quantification of oxidative clustered DNA lesions (OCDLs) and DSBs.
  • Utilizing a reverse genetic approach to assess the NHEJ pathway's contribution.

Main Results:

  • Biologically-relevant H2O2 levels significantly increased OCDLs and replication-independent DSBs.
  • H2O2, even at low concentrations, induced OCDLs and DSBs specifically in G1 cells.
  • The NHEJ pathway plays a significant role in repairing H2O2-induced DNA damage and mutagenesis.

Conclusions:

  • Low-level ROS, specifically H2O2, can induce OCDLs and DSBs, challenging previous assumptions.
  • This ROS-induced genomic instability may contribute to spontaneous mutagenesis and diseases such as cancer and neurodegeneration.

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