Low temperature plasma processing for cell growth inspired carbon thin films fabrication

Area of Science:

• Materials Science
• Biotechnology
• Surface Chemistry

Background:

• Bio-applications like bio-sensing and tissue engineering require stable carbon-based materials.
• Conventional methods for dense carbon film deposition necessitate high temperatures (>800°C), limiting substrate compatibility.
• There is a need for low-temperature deposition techniques for functional carbon coatings.

Purpose of the Study:

• To present a novel low-temperature pulsed-DC plasma sputtering process for depositing dense unhydrogenated carbon thin films.
• To investigate the influence of plasma parameters on film properties and bio-activity.
• To demonstrate the potential of these carbon films in bio-applications.

Main Methods:

• Utilized a pulsed-DC plasma sputtering process at temperatures below 150°C.
• Controlled plasma power density and pulsed frequency to manage ion flux and kinetic energy.
• Analyzed film properties (density, sp3/sp2 hybridization) and correlated them with bio-activity.
• Conducted bioactivity tests using mouse fibroblast L-929 and Saos-2 bone cell lines.

Main Results:

• Successfully deposited dense unhydrogenated carbon thin films at low temperatures (<150°C) without substrate bias or post-treatment.
• Demonstrated control over sp3 and sp2 hybridization content by tuning plasma parameters.
• Observed promising cell proliferation on the deposited carbon films in both L-929 and Saos-2 cell lines.

Conclusions:

• The low-temperature pulsed-DC plasma sputtering method is effective for producing dense carbon films suitable for bio-applications.
• Plasma parameter control is crucial for tailoring film properties and achieving desired bio-activity.
• These carbon films show significant potential for use in tissue engineering and bio-sensing applications.