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Updated: Mar 22, 2026

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

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Further insights into the chemistry of the Bi-U-O system

Karin Popa1, Damien Prieur1, Dario Manara1

  • 1European Commission, Joint Research Centre, Institute for Transuranium Elements, P.O. Box 2340, D-76125 Karlsruhe, Germany. karin.popa@ec.europa.eu.

Dalton Transactions (Cambridge, England : 2003)
|April 12, 2016
PubMed

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