The Electrical Double Layer
Biasing of Metal-Semiconductor Junctions
P-N junction
Metal-Semiconductor Junctions
Electrochemical Systems
Electrostatic Boundary Conditions in Dielectrics
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Scalable Quantum Integrated Circuits on Superconducting Two-Dimensional Electron Gas Platform
Published on: August 2, 2019
Pin-Zhi Wang1,2, Tian-Yi Cai2, Sheng Ju2
1School of Mathematics and Physics, Suzhou University of Science and Technology, Suzhou 215009, China.
Inserting an (AlO2)(-) atomic monolayer enhances ferroelectric tunneling junction performance by improving ferroelectricity. Conversely, (LaO)(+) insertion is unfavorable for ferroelectricity in these devices.
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