Double-Sided Opportunities Using Chemical Lift-Off Lithography

Anne M Andrews1,2,3, Wei-Ssu Liao4, Paul S Weiss1,2,5

  • 1California NanoSystems Institute, University of California, Los Angeles , Los Angeles, California 90095, United States.

Summary

Chemical lift-off lithography enables high-resolution nanopatterning by removing self-assembled monolayers with a reactive stamp. This process creates patterned monolayers on both the substrate and stamp, useful for sensing and advanced materials.

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