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Advances in Nanoimprint Lithography.

Matthew C Traub1, Whitney Longsine1, Van N Truskett1

  • 1Canon Nanotechnologies, Inc., Austin, Texas 78758;

Annual Review of Chemical and Biomolecular Engineering
|April 13, 2016
PubMed
Summary

Nanoimprint lithography (NIL) replicates nanoscale features for advanced manufacturing. This molding process, particularly UV-NIL, is advancing toward integrated circuit production and diverse applications.

Keywords:
J-FILJet and Flash Imprint LithographyUV-NILUV-curable nanoimprint lithographynanofabricationthermal NIL

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Area of Science:

  • Nanotechnology
  • Materials Science
  • Semiconductor Manufacturing

Background:

  • Nanoimprint lithography (NIL) is a high-resolution molding technique capable of replicating sub-10 nm features over large areas.
  • Existing semiconductor fabrication relies on conventional photolithography, which faces limitations in achieving ultra-fine feature sizes.
  • Thermal NIL and UV-NIL are the primary methods, each with distinct mechanisms and applications.

Purpose of the Study:

  • To detail the foundational principles and early development of thermal and UV nanoimprint lithography.
  • To compare NIL techniques with traditional photolithography in the semiconductor industry.
  • To highlight recent advancements in UV-curable NIL (UV-NIL) for integrated circuit (IC) production and explore emerging research areas.

Main Methods:

  • Review of fundamental principles of thermal and UV nanoimprint lithography.
  • Comparative analysis against conventional photolithography techniques.
  • Examination of current technological advancements and industrialization efforts for UV-NIL.

Main Results:

  • NIL can achieve feature replication below 10 nm with large-area, long-range order.
  • UV-NIL technology shows significant progress toward commercialization for IC fabrication.
  • NIL's capability to create arbitrary geometries opens new avenues in photonics and biotechnology.

Conclusions:

  • Nanoimprint lithography offers a powerful alternative to photolithography for high-resolution patterning.
  • The commercialization of UV-NIL is progressing, driven by advancements in tools and techniques.
  • NIL is enabling innovation across diverse scientific fields, from microelectronics to life sciences.