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"Sketch and Peel" Lithography for High-Resolution Multiscale Patterning.

Yiqin Chen¹, Quan Xiang¹, Zhiqin Li¹

¹School of Physics and Electronics, Key Laboratory for Micro-Nano Optoelectronic Devices of Ministry of Education, State Key Laboratory for Chemo/Biosensing and Chemometrics, Hunan University , Changsha 410082, People's Republic of China.

|April 14, 2016

Summary

This summary is machine-generated.

We developed Sketch and Peel lithography (SPL) for efficient, high-fidelity metallic structure patterning. This novel direct writing method achieves nanoscale precision for nanoelectronics and nano-optics.

Keywords:

Multiscale patterning electron-beam lithography nanogaps plasmonics selective peeling

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Area of Science:

Materials Science
Nanotechnology
Lithography

Background:

Direct writing lithography is crucial for fabricating nanoscale structures.
Existing methods face limitations in efficiency and proximity effects.

Purpose of the Study:

To introduce a novel lithographic process, Sketch and Peel lithography (SPL).
To demonstrate SPL's capability for fast, clean, and reliable patterning of metallic structures.
To explore SPL's potential in nanoelectronic and nano-optical applications.

Main Methods:

Utilizing presketched outlines as templates for selective peeling of evaporated metallic layers.
Employing direct writing technology for pattern definition.
Investigating the process for feature sizes ranging from tens of nanometers to submillimeter scale.

Main Results:

Achieved significantly improved patterning efficiency (hundreds of times higher) compared to current strategies.
Greatly mitigated proximity effects due to reduced exposure area.
Demonstrated high-fidelity definition of multiscale hierarchical metallic structures with minimal feature size of approximately 15 nm.

Conclusions:

Sketch and Peel lithography (SPL) offers a unique and effective approach for metallic structure fabrication.
SPL enables precise patterning across multiple scales, suitable for advanced nanoelectronic and nano-optical devices.
The process presents a significant advancement in direct writing lithography for nanoscale manufacturing.