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Facile Multiscale Patterning by Creep-Assisted Sequential Imprinting and Fuel Cell Application.

Segeun Jang, Minhyoung Kim1, Yun Sik Kang1,2

  • 1Center for Nanoparticle Research, Institute for Basic Science (IBS) , Seoul 151-742, Republic of Korea.

ACS Applied Materials & Interfaces
|April 28, 2016
PubMed
Summary

Researchers developed a novel creep-assisted sequential imprinting method to create multiscale hierarchical structures. This technique enhances polymer electrolyte membrane fuel cell performance by over 10% due to improved mass transport and interfacial surface area.

Keywords:
Nafioncreep behaviormultiscale patterningpolymer electrolyte membrane fuel cellsthermal imprinting

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Chemical Engineering

Background:

  • Fabricating multiscale structures is crucial for combining microscale and nanoscale benefits in engineering.
  • Existing methods often struggle to achieve desired morphology and large-area uniformity.

Purpose of the Study:

  • To develop a facile patterning method for creating multiscale hierarchical structures.
  • To demonstrate the application and performance enhancement of these structures in fuel cells.

Main Methods:

  • Utilized creep-assisted sequential imprinting, combining thermal imprinting lithography with mechanical deformation below the glass transition temperature (Tg).
  • Achieved nanopatterning followed by micropatterning through controlled polymer film deformation.
  • Fabricated uniform multiscale arrays over large areas.

Main Results:

  • Demonstrated excellent pattern uniformity in the fabricated multiscale arrays.
  • Incorporated multiscale Nafion films into polymer electrolyte membrane fuel cells.
  • Achieved over 10% performance enhancement compared to conventional devices.

Conclusions:

  • The novel creep-assisted sequential imprinting method effectively produces multiscale hierarchical structures.
  • The unique cone-shape morphology and increased interfacial surface area enhance fuel cell performance by reducing mass transport resistance.
  • This approach offers a promising pathway for advanced material fabrication and energy applications.