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    Researchers improved subwavelength nanostructure grating couplers for silicon photonics by decreasing the effective index, enabling larger apertures. This overcomes fabrication challenges, achieving over 35% coupling efficiency for TE polarization.

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    Area of Science:

    • Photonics
    • Nanotechnology
    • Materials Science

    Background:

    • Subwavelength nanostructure grating couplers on silicon-on-insulator (SOI) substrates offer simplified fabrication and high coupling efficiency.
    • Small nanostructure aperture sizes, particularly for TE polarization, pose fabrication challenges with deep-ultraviolet lithography and etching.

    Purpose of the Study:

    • To investigate methods for enlarging nanostructure aperture sizes in grating couplers for improved manufacturability.
    • To analyze the trade-offs between aperture size, coupling efficiency, and fabrication constraints for TE-polarized light.

    Main Methods:

    • Analysis of two aperture enlargement strategies: increasing lateral period and decreasing effective index.
    • Detailed study using rectangle-hole nanostructures on a 220 nm thick SOI waveguide layer.
    • Experimental demonstration of designed large-aperture grating couplers.

    Main Results:

    • Decreasing the effective index effectively enlarges the nanostructure aperture size.
    • Performance degenerations from large lateral periods can be compensated by adjusting rectangle-hole width.
    • Achieved minimum linewidth of 240 nm with only slight decreases in coupling efficiency.
    • Backreflections increased but remained comparable to ordinary gratings, manageable via apodization.

    Conclusions:

    • Decreasing effective index is a viable method for creating large-aperture grating couplers.
    • The proposed methods address key fabrication challenges for subwavelength nanostructures.
    • Experimental results confirm high coupling efficiencies (>35%) for the designed large-aperture grating couplers.