MOS Capacitor
Metal-Semiconductor Junctions
MOSFET
MOSFET: Enhancement Mode
Electrochemical Systems
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Wenhao Chen1, Runchen Fang, Mehmet B Balaban
1School of Electrical, Computer, and Energy Engineering, Arizona State University, Tempe, AZ 85287, USA.
This study explores resistance plasticity in copper/silicon dioxide/tungsten (Cu/SiO2/W) programmable metallization cell devices for artificial synapses. Results show tunable resistance, paving the way for efficient neuromorphic computing applications.
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