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High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells
Rongrui He1, Todd D Day1, Justin R Sparks1
1Department of Chemistry and Materials, Research Institute, Pennsylvania State University, University Park, PA, 16802, USA.
Advanced Materials (Deerfield Beach, Fla.)
|May 14, 2016
Abstract:
Thin films of hydrogenated amorphous silicon can be produced at MPa pressures from silane without the use of plasma at temperatures as low as 345 °C. High pressure chemical vapor deposition may open a new way to low cost deposition of amorphous silicon solar cells and other thin film structures over very large areas in very compact, simple reactors.
