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Updated: Mar 20, 2026
12:14
The Generation of Higher-order Laguerre-Gauss Optical Beams for High-precision Interferometry
Published on: August 12, 2013
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Development of high-order harmonic focusing system based on ellipsoidal mirror
H Motoyama1, T Sato2, A Iwasaki2
1Department of Precision Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkuyo-ku, Tokyo 113-8656, Japan.
The Review of Scientific Instruments
|June 3, 2016
Summary
Researchers created a new focusing system for extreme ultraviolet light. This system, using a precisely shaped ellipsoidal mirror, achieved a focused spot size of 2.4 × 2.3 μm(2) for high-order harmonics.
Area of Science:
- Optics and Photonics
- Laser Physics
- Materials Science
Background:
- Extreme ultraviolet (EUV) light generation via high-order harmonic generation (HHG) is crucial for various applications.
- Efficiently focusing EUV light is challenging due to its short wavelengths and the requirements for precise optical components.
Purpose of the Study:
- To develop and demonstrate a high-performance focusing system for EUV light generated by HHG.
- To achieve precise alignment and stable operation of the focusing optics.
Main Methods:
- Fabrication of a custom ellipsoidal mirror with high surface precision.
- Integration of a rigid mirror manipulator for stable alignment.
- Utilization of a beam profiler for real-time alignment monitoring and optimization.
Main Results:
- Successful implementation of the EUV focusing system.
- Demonstrated precise and stable alignment of the ellipsoidal mirror.
- Achieved focusing of high-order harmonics (13.5-19.5 nm) to a small spot size of 2.4 × 2.3 μm(2).
Conclusions:
- The developed focusing system enables efficient concentration of EUV light.
- The system's performance is suitable for applications requiring high spatial resolution EUV sources.
- Precise optical fabrication and alignment are key to achieving diffraction-limited focusing for HHG sources.
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