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Aperture alignment in autocollimator-based deflectometric profilometers.

R D Geckeler1, N A Artemiev2, S K Barber2

  • 1Physikalisch-Technische Bundesanstalt, Bundesallee 100, 38116 Braunschweig, Germany.

The Review of Scientific Instruments
|June 3, 2016
PubMed
Summary
This summary is machine-generated.

Precise alignment of apertures in deflectometric profilometers is key for accurate optical surface metrology. This study details alignment procedures and analyzes aperture positioning effects on angle measurements for advanced beamline applications.

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Area of Science:

  • Optical metrology
  • Surface characterization
  • X-ray optics

Background:

  • Deflectometric profilometers are essential for precision optical surface measurement, particularly for X-ray beamline applications.
  • These instruments rely on autocollimators for contactless slope measurement, using a movable aperture to define the beam footprint.
  • Accurate and traceable angle metrology depends critically on the reproducible alignment of this aperture.

Purpose of the Study:

  • To present a precise and reproducible aperture alignment procedure for deflectometric profilometers.
  • To investigate the impact of aperture positioning on autocollimator angle response.
  • To establish fundamental metrological limits in deflectometric profilometry.

Main Methods:

  • Development and presentation of a specific aperture alignment procedure at the Advanced Light Source.
  • Extensive ray tracing simulations to model the optical system.
  • Calibration of a commercial autocollimator at the Physikalisch-Technische Bundesanstalt to evaluate positioning effects.

Main Results:

  • A validated procedure for precise aperture alignment in deflectometric profilometry.
  • Quantification of the effects of aperture positioning on autocollimator angle measurements.
  • Identification of critical factors influencing metrological performance.

Conclusions:

  • Precise aperture alignment is crucial for the accuracy and traceability of deflectometric profilometry.
  • Understanding aperture positioning effects enables optimization of measurement conditions.
  • This work contributes to achieving fundamental metrological limits in advanced optical surface characterization.