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Hierarchical Manipulation of Block Copolymer Patterns on 3D Topographic Substrates: Beyond Graphoepitaxy
Sungjune Park1, Xiao Cheng1, Alexander Böker2
1DWI-Leibniz-Institute für Interaktiven Materialien and Institut für Physikalische Chemie, RWTH Aachen University, Forckenbeckstraße 50, 52056, Aachen, Germany.
Abstract:
Templates of complex nanopatterns in a form of hierarchically sequenced dots and stripes can be generated in block copolymer films on lithography-free 3D topographic substrates. The approach exploits thickness- and swelling-responsive morphological behavior of block copolymers, and demonstrates novel possibilities of topography-guided registration of nanopatterns due to periodic confinement and spontaneous orthogonal flow-fields.

