Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation
Nicolas D Boscher1,2, Minghui Wang1, Alberto Perrotta3
1Department of Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA.
Advanced Materials (Deerfield Beach, Fla.)
|June 15, 2016
Abstract:
The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal-organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.
