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Updated: Mar 19, 2026
Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
Published on: November 9, 2015
Nanoscale silicon surface-assisted laser desorption/ionization mass spectrometry: environment stability and
Chia-Wen Tsao1, Yuan-Jing Lin1, Pi-Yu Chen2
1Department of Mechanical Engineering, National Central University, No. 300, Zhongda Rd., Taoyuan, Taiwan. cwtsao@ncu.edu.tw.
Abstract:
Nanoscale silicon surface-assisted laser desorption/ionization mass spectrometry (SALDI-MS) is an emerging matrix-free, highly sensitive MS analysis method. An important challenge in using nanoscale silicon SALDI-MS analysis is the aging and stability of silicon after storage in various environments. No proper nanoscale silicon SALDI-MS activation procedure has been reported to solve this issue. This study investigated the sensitivity, wettability, and surface oxidation behavior of nanoscale silicon surface SALDI-MS in a room, an inert gas atmosphere, and a vacuum environment. A simple vacuum oven desiccation was proposed to activate the SALDI-MS surface, and the limit of detection was further enhanced 1000 times to a 500 attomole level using this approach. The long-term stability and desorption/ionization mechanism were also investigated.
