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Isoelectronic Tungsten Doping in Monolayer MoSe2 for Carrier Type Modulation
Xufan Li1, Ming-Wei Lin1, Leonardo Basile2
1Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA.
Isoelectronic doping converts n-type molybdenum diselenide (MoSe2) into p-type molybdenum tungsten diselenide (Mo1-xWxSe2). This carrier-type modulation in 2D materials is linked to localized W-rich regions.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Solid State Chemistry
Background:
- Two-dimensional transition metal dichalcogenides (TMDs) exhibit unique electronic properties.
- Controlling carrier type in monolayer TMDs is crucial for advanced electronic devices.
- Molybdenum diselenide (MoSe2) is a prominent n-type semiconductor in the TMD family.
Purpose of the Study:
- To demonstrate carrier-type modulation in 2D transition metal dichalcogenides.
- To convert n-type monolayer MoSe2 into a p-type semiconductor via isoelectronic doping.
- To investigate the origin of p-type conduction in the resulting alloy.
Main Methods:
- Isoelectronic doping of monolayer MoSe2 with tungsten (W).
- Synthesis of mesoscopically uniform monolayer Mo1-xWxSe2 alloys.
- Analysis of valence band shifts and conduction mechanisms.
Main Results:
- Successful conversion of n-type monolayer MoSe2 to nondegenerate p-type monolayer Mo1-xWxSe2.
- Mesoscopic uniformity of the synthesized Mo1-xWxSe2 alloys.
- Identification of highly localized "W-rich" regions as the origin of p-type conduction.
Conclusions:
- Isoelectronic doping is an effective strategy for carrier-type modulation in 2D TMDs.
- Localized compositional fluctuations can dictate electronic properties in alloyed TMDs.
- Understanding these localized effects is key for designing next-generation 2D electronic devices.
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