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Updated: Mar 17, 2026

Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
Published on: November 24, 2016
M M Muhammed1, M A Roldan2, Y Yamashita3
1King Abdullah University of Science and Technology (KAUST), Physical Sciences and Engineering Division, Thuwal 23955-6900, Saudi Arabia.
High-quality Indium Gallium Nitride (InxGa1-xN) epilayers were grown on (01)-oriented beta-Gallium Oxide (β-Ga2O3) substrates. This method enhances crystal quality and optical properties for vertical light-emitting devices.
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