Importance of Interface Diffusion and Climate in Defect Dominated Moisture Ultrabarrier Applications

Frederik Nehm1, Felix Dollinger1, John Fahlteich2

  • 1Institut für Angewandte Photophysik, Technische Universität Dresden , 01062 Dresden, Germany.

Summary

Ultrahigh moisture barriers for organic electronics are crucial. This study reveals how barrier performance changes with varying temperature and humidity, uncovering a time-dependent diffusion shift.

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