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Updated: Mar 16, 2026
Gyroid Nickel Nanostructures from Diblock Copolymer Supramolecules
Published on: April 28, 2014
Complex High-Aspect-Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self-Assembly
Hwan-Jin Jeon1,2, Ju Young Kim3,4, Woo-Bin Jung5
1National Research Laboratory for Organic Opto-Electronic Materials, Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea. hjjeon@nnfc.re.kr.
Abstract:
High-resolution (10 nm), high-areal density, high-aspect ratio (>5), and morphologically complex nanopatterns are fabricated from a single conventional block copolymer (BCP) structure with a 70 nm scale resolution and an aspect ratio of 1, through the secondary-sputtering phenomenon during the Ar-ion-bombardment process. This approach provides a foundation for the design of new routes to BCP lithography.
