Effects of femtosecond laser pulse width on the formation of microstructured silicon

We experimentally investigated the properties of surface microstructured silicon fabricated by 15 and 130 fs laser pulses. By changing parameters of femtosecond laser pulses, including laser flux, actual pulse acting time, and laser peak intensity, we found that the average height of spikes on the surface of microstructured silicon are only determined by the laser peak intensity. These results are important for the preparation and structure control of microstructured silicon.