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Aperiodic Mo/Si multilayers for hard x-rays.
Optics Express
|August 10, 2016
Summary
Researchers developed aperiodic Molybdenum/Silicon (Mo/Si) multilayers (MLs) for hard X-ray reflection. These advanced Mo/Si multilayers achieve 28% reflectivity, ideal for imaging applications.
Area of Science:
- Materials Science
- Optics
- X-ray Physics
Background:
- Aperiodic multilayers (MLs) are crucial for advanced X-ray optics.
- Molybdenum/Silicon (Mo/Si) systems are promising for hard X-ray applications.
- Fabricating Mo/Si MLs for hard X-rays presents unique manufacturing challenges.
Purpose of the Study:
- To develop and characterize aperiodic Mo/Si multilayers for reflecting 16.25 keV photons.
- To address manufacturing challenges associated with high-reflectivity hard X-ray MLs.
- To evaluate the performance of these MLs for imaging applications.
Main Methods:
- Fabrication of aperiodic Mo/Si multilayers with precise thickness control.
- Characterization of multilayer structure and interfacial properties.
- Experimental measurement of reflectivity at 16.25 keV and grazing incidence.
Main Results:
- Successfully developed aperiodic Mo/Si MLs for 16.25 keV photon reflection.
- Achieved an average experimental reflectivity of 28% within a narrow angular acceptance.
- Demonstrated control over interfacial silicide layers and avoided undesirable Mo phase transitions.
Conclusions:
- Aperiodic Mo/Si MLs are feasible for hard X-ray applications.
- The developed MLs show potential for imaging highly diverging X-ray sources.
- This work advances the design and fabrication of advanced X-ray optical components.
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