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Towards ALD thin film stabilized single-atom Pd1 catalysts
Mar Piernavieja-Hermida1, Zheng Lu1, Anderson White1
1Department of Chemical and Materials Engineering, University of Alabama in Huntsville, Huntsville, Alabama 35899, USA. yu.lei@uah.edu.
Nanoscale
|August 11, 2016
Summary
Atomic layer deposition (ALD) stabilizes single-atom palladium (Pd1) catalysts within nanocavities, preventing agglomeration. This thin-film stabilization enhances thermal stability and offers a new design strategy for efficient and durable single-atom catalysts.
Area of Science:
- Catalysis
- Materials Science
- Nanotechnology
Background:
- Single-atom catalysts (SACs) offer high activity and selectivity.
- Mobility of single atoms leads to agglomeration, reducing catalytic efficiency.
- Need for strategies to stabilize single-atom species.
Purpose of the Study:
- To develop a method for synthesizing thermally stable single-atom palladium (Pd1) catalysts.
- To investigate the role of atomic layer deposition (ALD) in stabilizing Pd1 catalysts.
- To evaluate the catalytic performance and stability of ALD-protected Pd1 catalysts.
Main Methods:
- Synthesis of thin-film stabilized Pd1 catalysts using ALD.
- In situ infrared spectroscopy and Pd K-edge X-ray absorption spectroscopy (XAS) for characterization.
- Evaluation of catalytic performance in methanol decomposition.
Main Results:
- ALD created nanocavity thin films significantly enhanced Pd1 thermal stability.
- Pd1 was anchored via chlorine sites, showing stability under oxidation and reduction.
- Catalytic activity in methanol decomposition depended on TiO2 protecting layer thickness.
- Strong CO adsorption on Pd1 at high temperatures limited reactivity compared to Pd nanoparticles.
Conclusions:
- ALD nanocavities provide effective stabilization for single-atom catalysts.
- The developed method offers a pathway for designing highly efficient and stable single-atom catalysts.
- Understanding surface interactions and reaction conditions is crucial for optimizing SAC performance.
