Microstructure evolution with varied layer thickness in magnetron-sputtered Ni/C multilayer films.

Area of Science:

• Materials Science
• Thin Film Technology

Background:

• Nanostructured multilayers are crucial for advanced applications.
• Controlling interfaces in nickel/carbon (Ni/C) multilayers is key to tailoring their properties.

Purpose of the Study:

• Investigate microstructure evolution in Ni/C multilayers.
• Understand the impact of varying Ni and C layer thicknesses on interface properties.

Main Methods:

• Magnetron sputtering technique used for multilayer fabrication.
• Systematic variation of Ni and C layer thicknesses in the nanometer range.

Main Results:

• Interface width increases as Ni layer thickness decreases (e.g., from 4.3 to 1.3 nm for 2.6 nm C layers).
• Significant interface broadening observed for Ni layers < 2.0 nm due to discontinuous Ni crystallites.
• Interface width also increases with decreasing C layer thickness (e.g., from 4.3 to 0.7 nm for 2.8 nm Ni layers).

Conclusions:

• Ni/C multilayer microstructure is sensitive to individual layer thicknesses.
• A simple growth model explains the observed interface evolution.
• Precise control over layer thickness is essential for designing Ni/C multilayer interfaces.